sputtered porous li-fe-p-o film cathodes prepared by radio frequency sputtering for li-ion microbatteries - scientific reports
the increasing demands from micro-power applications call for the development of the electrode materials for li-ion microbatteries using thin-film technology. porous olivine-type lifepo4 (lfp) and nasicon-type li3fe2(po4)3 have been successfully fabricated by radio frequency (rf) sputtering and post-annealing treatments of lfp thin films. the microstructures of the lfp films were characterized by x-ray diffraction and scanning electron microscopy. the electrochemical performances of the lfp films were evaluated by cyclic voltammetry and galvanostatic charge-discharge measurements. the deposited and annealed thin film electrodes were tested as cathodes for li-ion microbatteries. it was found that the electrochemical performance of the deposited films depends strongly on the annealing temperature. the films annealed at 500 °c showed an operating voltage of the porous lfp film about 3.45 v vs. li/li+ with an areal capacity of 17.9 µah cm−2 µm−1 at c/5 rate after 100 cycles. porous nasicon-type li3fe2(po4)3 obtained after annealing at 700 °c delivers the most stable capacity of 22.1 µah cm−2 µm−1 over 100 cycles at c/5 rate, with an operating voltage of 2.8 v vs. li/li+. the post-annealing treatment of sputtered lfp at 700 °c showed a drastic increase in the electrochemical reactivity of the thin film cathodes vs. li+, leading to areal capacity ~9 times higher than as-deposited film (~27 vs. ~3 µah cm−2 µm−1) at c/10 rate.
what is magnetron sputtering 🧲 - staton coating
discover the science behind magnetron sputtering, a technique used to create thin films for electronics and materials science. learn its applications and benefits.
dielectric thin films through rf sputtering
insulators cannot be sputtered with standard dc glow discharge techniques, because the accelerating potential cannot be directly applied and because the positiv
sputtering process in nanotechnology
sputtering process is one of the processes to form thin films.it is very useful across several industries such as optical coatings, semiconductors,and many more
thin-film materials by rf sputtering
we report on the development of several different thin-film material systems prepared by rf magnetron sputtering at edith cowan university nanofabricatio...
what is the rf sputtering technique? 5 key points to know
the answer to "what is the rf sputtering technique? 5 key points to know"
magnetron sputtering description - nordiko technical service ltd
the introduction of magnetron sputtering has had a massive effect on the practical applications for sputtering.
rf dielectric sputter system
the pvd 75 rf sputter system features a modular design for deposition of a variety of dielectric materials. the system has manual controls allowing for a wide range of processing options. an optical monitor provides the option for deposition monitoring of optical films at multiple wavelengths in the vis or ir spectrums. up to 3 separate films can be deposited sequentially.
dc/rf dual-head high vacuum 2” magnetron plasma sputtering coater - vtc-600-2hd
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pulsed high-voltage dc rf sputtering - nasa technical reports server (ntrs)
sputtering technique uses pulsed high voltage direct current to the object to be plated and a radio frequency sputtered film source. resultant film has excellent adhesion, and objects can be plated uniformly on all sides.
reactive sputtering – angstrom sciences technology - reactive sputter deposition
reactive sputtering is a variation of the sputtering or pvd deposition process in which the target material and an introduced gas into the chamber create a chemical reaction and can be controlled by pressure in the chamber.
cerium oxide film growth using radio-frequency sputtering process
explore the impact of operating conditions on cerium oxide film growth using rf sputtering. discover the influence of process variables on grain size and film thickness through sem, xrd, and α-step processes. gain insights into crystal size and film thickness effects through regression analysis.
advances in rf sputtering
rf sputtering provides several advantages: it works well with insulating targets the sign of the electrical field at every surface inside the plasma chamber is changing with the driving rf frequency. this avoids charge-up effects and reduces arcing. rf diode sputtering technology, recently developed works even better, because it does not need magnetic confinement and provides …
brief introduction of rf sputtering - aem deposition
aem deposition shares the brief introduction of rf sputtering for all of you. we also provide high quality sputtering targets for sale.
sputtering power supplies | angstrom sciences
angstrom science’s sputtering power supply is offered in many types of sputtering power including pulsed sputtering, rf sputtering and dc.
rf sputtering advantages | rf sputtering disadvantages
this page covers advantages and disadvantages of rf sputtering technique.it mentions rf sputtering advantages and rf sputtering disadvantages.
sputtering systems
pvd products manufactures magnetron sputtering systems for metallic and dielectric thin film deposition on substrates up to 300 mm in diameter.
the role of un-balanced magnetron sputtering - vaccoat
the role of un-balanced magnetron sputtering on the characteristics of tin dioxide thin-film.
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radio frequency magnetron sputtering of bi2te3 and sb2te3 thermoelectric thin films on glass substrates
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investigation of the rf sputtering process and the properties of deposited silicon oxynitride layers under varying reactive gas conditions
in a single process run, an amorphous silicon oxynitride layer was grown, which includes the entire transition from oxide to nitride. the variation of the optical properties and the thickness of the layer was characterized by spectroscopic ellipsometry (se) measurements, while the elemental composition was investigated by energy dispersive spectroscopy (eds). it was revealed that the refractive index of the layer at 632.8 nm is tunable in the 1.48–1.89 range by varying the oxygen partial pressure in the chamber. from the data of the composition of the layer, the typical physical parameters of the process were determined by applying the berg model valid for reactive sputtering. in our modelling, a new approach was introduced, where the metallic si target sputtered with a uniform nitrogen and variable oxygen gas flow was considered as an oxygen gas-sputtered sin target. the layer growth method used in the present work and the revealed correlations between sputtering parameters, layer composition and refractive index, enable both the achievement of the desired optical properties of silicon oxynitride layers and the production of thin films with gradient refractive index for technology applications.
rf sputtering of multilayer thin films
thin-film deposition rates and uniformity are presented for a large area rf diode of conventional style, with optimized parameters producing 1500 Å/min copper a
ac and rf reactive sputtering | 4 | handbook of thin film process tech
sputtering is a low pressure physical vapor deposition process where ions are accelerated from a plasma across a potential drop to bombard the sputtering
what is sputtering and how does sputter deposition work?
sputtering is a physical process applied in several industries nowadays. here, you'll understand its procedure and applications in thin-film manufacturing.
rf vs. dc sputtering: choosing the right method
rf dc sputtering; explore the differences between rf and dc sputtering techniques. learn how to select the most suitable sputtering method
what is rf sputtering?
rf sputtering alternates the current in the vacuum at radio frequencies to avoid a charge building up on certain types of sputtering target materials.
what is sputtering? pvd magnetron sputtering systems
written by matt hughes - president - semicore equipment, inc. published: 24 november 2014 sputtering is the thin film deposition manufacturing process at the core of today’s semiconductors, disk drives, cds, and optical devices industries.
more about rf sputtering
phasis provides epitaxial thin films to meet the needs of research, development and industry.
kurt j. lesker company
enabling technology for a better world
what is sputtering? - ulvac
sputtering is a method of thin film deposition, which is a type of pvd (physical vapor deposition). in this process, a substrate to be coated with thin film (glass substrate, si-wafer, etc.) and target (material for the thin film) are placed into a vacuum chamber, that becomes filled with an inert gas (generally, argon). when high
vacuum coating by sputter technology - leybold
get introduced to sputter coating technologies, typical uses, and how vacuum technology is applied to the process.
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enjoy the videos and music that you love, upload original content and share it all with friends, family and the world on youtube.
dc/rf dual-head high vacuum magnetron plasma sputtering system
dc/rf dual-head high vacuum magnetron plasma sputtering system with thickness monitor
how does rf sputtering work? - a comprehensive guide to 6 key steps
the answer to "how does rf sputtering work? - a comprehensive guide to 6 key steps"
the comparison of dc sputtering and rf sputtering
what
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